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Room-temperature deposition of crystalline patterned ZnO films by confined dewetting lithography
SELENE SEPULVEDA GUZMAN
UBALDO ORTIZ MENDEZ
CLAUDIA REYES BETANZO
Acceso Abierto
Atribución-NoComercial-SinDerivadas
Confined dewetting lithography
ZnO nanoparticles
Microcontact printing
Nano-patterning
In this work patterned ZnO films were prepared at room-temperature by deposition of ∼5 nm size ZnO nanoparticles using confined dewetting lithography, a process which induces their assembly, by drying a drop of ZnO colloidal dispersion between a floating template and the substrate. Crystalline ZnO nanoparticles exhibit a strong visible (525 nm) light emission upon UV excitation (λ = 350 nm). The resulting films were characterized by scanning electron microscopy (SEM) and atomic force microscope (AFM). The method described herein presents a simple and low cost method to prepare crystalline ZnO films with geometric patterns without additional annealing. Such transparent conducting films are attractive for applications like light emitting diodes (LEDs). As the process is carried out at room temperature, the patterned crystalline ZnO films can even be deposited on flexible substrates.
Elsevier B.V.
2010
Artículo
Inglés
Estudiantes
Investigadores
Público en general
Sepulveda-Guzman, S., et al., (2010). Room-temperature deposition of crystalline patterned ZnO films by confined dewetting lithography, Applied Surface Science, (256): 3386–3389
ELECTRÓNICA
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acceptedVersion - Versión aceptada
Aparece en las colecciones: Artículos de Electrónica

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