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Issue Date | Title | Publication Type/ Resource Type | Author(s) | Submit Date |
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Jan-2013 | Physical and electrical characteristics of atomic-layer deposition-HfO₂ films deposited on Si substrates having different silanol Si-OH densities | Artículo | Joel Molina Reyes; CARLOS ZUÑIGA ISLAS; Wilfrido Calleja Arriaga; Pedro Rosales Quintero; ALFONSO TORRES JACOME | 28-Mar-2022 |