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On the characterization of the trapped charge in FG-CMOS inverters
JESUS EZEQUIEL MOLINAR SOLIS
RODOLFO ZOLA GARCIA LOZANO
IVAN RODRIGO PADILLA CANTOYA
ALEJANDRO DIAZ SANCHEZ
JOSE MIGUEL ROCHA PEREZ
Acceso Abierto
Atribución-NoComercial-SinDerivadas
Neuron-MOS
vMOS
Floating-gate transistors
In this work, an experimental comparison between measured FG CMOS inverters using the quasifloating gate (QFG) and layout-based (L-b) techniques for charge removal in the Floating-gate (FG) and simulations through PSpice is presented. The experiment was developed through the measurements of 40 different IC’s with a total of 200 FG and QFG CMOS inverters characterized on AMI C5FN 0.5 lm technology. The data obtained shows that the layout-based technique reduces the initial charge present at the FG, but presents a very small residual charge. Nevertheless, the offset associated to the charge follows a normal distribution and is predictable. Comparison between measured QFG inverters and simulations shows that the high resistance parasitic diode must be modeled accurately for a proper simulation.
Springer Science+Business Media
2009
Artículo
Inglés
Estudiantes
Investigadores
Público en general
Molinar-Solis, J.E., et al., (2009). On the characterization of the trapped charge in FG-CMOS inverters, Analog Integr Circ Sig Process (61): 191–198
ELECTRÓNICA
Versión aceptada
acceptedVersion - Versión aceptada
Aparece en las colecciones: Artículos de Electrónica

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