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http://inaoe.repositorioinstitucional.mx/jspui/handle/1009/2094| High-quality spin-on glass-based oxide as a matrix for embedding HfO₂ nanoparticles for metal-oxide-semiconductor capacitors | |
| Joel Molina Reyes ANA LUZ MUÑOZ ROSAS Wilfrido Calleja Arriaga Pedro Rosales Quintero ALFONSO TORRES JACOME | |
| Acceso Abierto | |
| Atribución-NoComercial-SinDerivadas | |
| High-quality spin-on glass-based oxide Metal-oxide-semiconductor capacitors | |
| By using a low cost, simple, and reproducible spin-coating method, thin films of SOG (spin-on-glass)-based oxides with electrical characteristics resembling those of a dry thermal oxide have been obtained. The superior electrical characteristics of Metal-Oxide-Semiconductor (MOS) capacitors based on SOG-oxides come from both (1) reducing the organic content of the SOG solutions after dilution with deionized water and (2) passivation of the silicon surface by a thin chemical oxide. Fourier transform infrared spectroscopy analysis shows that the organic content in H₂O-diluted SOG-oxides is reduced compared to undiluted SOG after N₂ annealing. In addition, by chemically embedding HfO₂ nanoparticles (np-HfO₂) to these SOG-based oxides, an effective increase in the accumulation capacitance of MOS capacitors is observed and this is related to the increase in the final dielectric constant of the resulting oxide after annealing so that potential use of SOG as a glass matrix for embedding HfO₂ nanoparticles and produce higher-k oxide materials is demonstrated. | |
| J. Mater Sci. | |
| 2012 | |
| Artículo | |
| Inglés | |
| Estudiantes Investigadores Público en general | |
| Molina, Joel, et al., (2012), High-quality spin-on glass-based oxide as a matrix for embedding HfO₂ nanoparticles for metal-oxide-semiconductor capacitors, J. Mater Sci, Vol. 47:2248–2255. | |
| ELECTRÓNICA | |
| Versión aceptada | |
| acceptedVersion - Versión aceptada | |
| Aparece en las colecciones: | Artículos de Electrónica |
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