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Germanium metal-semiconductor-metal photodetectors evanescently coupled with upper-level silicon oxynitride dielectric waveguides
ALFONSO TORRES JACOME
Ignacio Enrique Zaldívar Huerta
Acceso Abierto
Atribución-NoComercial-SinDerivadas
Dielectric waveguides
Electrodes
Elemental semiconductors
Ge-Si alloys
Metal-semiconductor-metal structures
Photodetectors
Silicon compounds
We demonstrate Ge-on-Si metal-semiconductor-metal (MSM) photodetectors monolithically integrated with silicon oxynitride (SiOxNy) waveguides. The waveguide is placed on top of the photodetector and between the metal electrodes, evading the shading effect by metal electrodes, which is typical in surface-illuminated MSM photodetectors. The devices showed responsivity of about 0.45 A/W for 80 μm long devices at 1550 nm. The photodetector with 1.5 μm electrode spacing showed 3 dB bandwidth of 2.0 GHz at -2V and 2 μA dark current. Further studies suggest that with a modified design the structure is capable of achieving 1 A/W responsivity and greater bandwidth. © 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4773212]
Applied Physics Letters
28-12-2012
Artículo
Inglés
Estudiantes
Investigadores
Público en general
Cervantes-González, Juan C., et al., (2012), Germanium metal-semiconductor-metal photodetectors evanescently coupled with upper-level silicon oxynitride dielectric waveguides, Applied Physics Letters, Vol. 101(26):1-4
ELECTRÓNICA
Versión aceptada
acceptedVersion - Versión aceptada
Aparece en las colecciones: Artículos de Electrónica

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