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Resistive bridge defect detection enhancement under parameter variations combining Low VDD and body bias in a delay based test
Héctor Luis Villacorta Minaya
Víctor Hugo Champac Vilela
Acceso Abierto
Atribución-NoComercial-SinDerivadas
Resistive bridges
Nanometer technologie
CMOS technology
Resistive bridges are a major class of defects in nanometer technologies that can escape test, posing a serious reliability risk for CMOS IC circuits. The increase of process parameter variations represents a challenge for resistive bridge detection using traditional test methods, and requires more efficient test methods to be developed. In this work, we show that resistive bridge detection improves by correlating the defect-induced extra circuit delay with the power supply voltage value and the reverse body bias (RBB) applied. A Timing Critical Resistance (Rᵗcrit) is defined as a metric to quantify the resistive bridge detection enhancement in the presence of process variations under a delay based test. We show that the smaller the supply voltage, the higher the resistive bridge detection which further enhances by applying RBB. Results are presented for a 65 nm CMOS technology.
Microelectronics Reliability
2012-11
Artículo
Inglés
Estudiantes
Investigadores
Público en general
Villacorta, H., et al., (2012), Resistive bridge defect detection enhancement under parameter variations combining Low VDD and body bias in a delay based test, Microelectronics Reliability, Vol. 52(11):2799–2804.
ELECTRÓNICA
Versión aceptada
acceptedVersion - Versión aceptada
Aparece en las colecciones: Artículos de Electrónica

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